Hydrofluoric acid

Hydrofluoric acid (CAS 7664-39-3), also supplied as anhydrous hydrogen fluoride (HF), is an inorganic acid with exceptional ability to dissolve silica, oxides, and mineral scales that resist other acids. This property drives its use across electronics fabrication, metal surface treatment, and chemical synthesis at industrial scale. In semiconductor and flat-panel display manufacturing, HF etches silicon dioxide layers.

It cleans wafer surfaces with precision tolerances that other acids cannot achieve. Metal processing operations use it to pickle stainless steel and titanium, removing oxide scale and activating surfaces ahead of finishing. Fluorochemical synthesis relies on HF as a primary fluorinating agent in the production of refrigerants, fluoropolymers, and pharmaceutical intermediates. In mining and hydrometallurgy, it dissolves silicate gangue minerals.

The acid assists in uranium conversion processes during ore processing. Hydrofluoric acid is supplied as aqueous solution, with 40%, 49%, and 70% concentrations being the most commercially standard grades. Anhydrous hydrogen fluoride is available for industrial fluorination processes where water content must be minimized. Grades include technical, electronic, and reagent specifications for various industrial needs.

Electronic-grade material is subject to strict trace metal and particle limits. Our supply meets rigorous quality standards to ensure performance in high-precision manufacturing and chemical synthesis applications.